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图像分析

Field Emission Scanning Electron Microscope (FE-SEM)场发射扫描电子显微镜

 Imaging from 10 V to 30 kV

Resolution: 0.8 nm at 15 kV; 1.2 nm at 1 kV

 Magnification: 25 times to 1,000,000 times

 The FESEM has 4 detectors:

1)In lens secondary detector;

2)Everhart Thornley secondary detector;

3)Energy selective secondary/backscattered electron detector for topography/compositional contrast imaging at low voltages;

4)Retractable backscatter detector for composition contrast imaging;

 Aperture Control lens that automatically optimizes the probe current and beam size depending on the imaging conditions

 Beam deceleration mode to reduce charging of non-conducting specimens Motorized stage with travel in 5 axes

Integrated 200 mm airlock for fast sample changes

Scanning Transmission Electron Microscope (STEM)扫描透射电子显微镜

Acceleration voltage range: 80 kV to 300 kV with preset alignment for 80 kV, 200 kV, and 300 kV

Scanning transmission electron microscopy mode

Convergent beam and selected area electron diffraction modes

Conventional TEM modes

Point-to-point spatial resolution in TEM mode: 0.20 nm at 300 kV

STEM resolution: 0.136 nm at 300 kV

Super-twin objective lens pole piece

Gatan Orius digital camera (2000 x 2000 pixels)

Fischione high angle annular dark field STEM detector for Z-contrast imaging

Gatan QuantumSE™ energy filter for electron energy loss spectroscopy and energy-filtered TEM; filter energy spread: 0.8 eV

EDAX Si(Li) x-ray energy-dispersive spectrometer; energy resolution: 0.136 eV

Tomography acquisition, reconstruction, and analysis software

Analytical, heating, cooling, and tomography specimen holders

High Resolution Atomic Force Microscope高分辨率原子力显微镜

Phase imaging, contact mode, and tapping mode

Electrostatic force microscopy

Magnetic force microscopy

Sample characterization in liquid

X-Y scan range: 35 µm x 35 µm

Z range: 6 µm

User customizable software and hardware inputs

Viscoelastic mapping of mechanical properties

Nanoscale mechanical properties for diverse materials

Force spectroscopy

Surface roughness measurements

Electrical measurements

Piezoresponse force mapping

X-Ray DiffractionX射线衍射

9 kW rotating anode x-ray generator

X-ray generator ranges: 20 kV to 45 kV; 10 mA to 200 mA

Scintillation point detector and a high-speed position sensitive detector system

Five axis high resolution goniometer with an Eulerian cradle, X-Y-Z sample stage

Parallel beam optics with a multi-layer X-ray mirror

Bragg Brentano focusing optics

Computer controlled variable divergence slit, variable anti-scatter slit, and receiving slit

Germanium (220) 2-bounce and 4-bounce channel cut monochromators, and a germanium (220) 2-bounce analyzer

Anton Paar domed hot stage for high temperature measurements of up to 1100 oC in air, vacuum, or inert gas

FE-SEM and FIB场发射扫描电子显微镜与聚焦离子束

FE-SEM

Resolution: sub-nanometer from 1 kV to 30 kV

High resolution triple in-lens electron detectors with Through Lens (TLD, secondary and backscatter mode), In Column (ICD, low-loss backscatter), and Mirror (MD, no-loss backscatter) detectors

Scanning transmission electron microscopy (STEM) detector with bright-field (BF), dark-field (DF), and high-angle annular dark-field (HAADF) segments

Electron beam deceleration for 50 V effective landing voltage

5-axis stage with 150 mm X-Y range and full rotation

Integrated plasma cleaner to minimize contamination

FIB (Gallium ion source)

Resolution: 2.5 nm at 30 kV

High current for fast milling of large areas

High efficiency secondary ion detector

Electron flood gun for ion charge compensation

Integrated beam current measurement to allow faster ion beam calibrations while samples are already in the chamber

Real time monitoring of milling and deposition processes

End point monitoring for cross sectioning and circuit editing applications

Oxford/Omniprobe 300 manipulator for removing transmission electron microscopy (TEM) samples

Enhanced capabilities for simultaneous chemical characterization using energy dispersive x-ray spectroscopy on an Oxford Instruments X-Max 80 mm2 SDD-EDS detector and material crystallographic characterization using electron backscatter diffraction on an Oxford Instruments

NordlysMax2 EBSD detector

Gas injection system chemistries

Platinum deposition

Carbon deposition

Insulator deposition using tetraethyl orthosilicate (TEOS)

Selective carbon etch

Insulator enhanced etching using xenon difluoride (XeF2)



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